カテゴリー:結晶・材料

■よくあるお問い合わせ■  ※※※商品名等の“1sp”は片面研磨、“2sp”は両面研磨を表しております※※※

Su01-1セラミック基板 Su02-122単結晶基板
Su03-1金属基板 Su04-1各種粉末製品
Su05-1ターゲット材料・蒸着材料 Su06-1薄膜基板

Knowledge Center

           MTI Corporation


Knowledge on Crystal Growth

Verneuil method (doc) (Flamge fusion)
Czochralski method (doc) (Pulling up)
Bridgman method (doc) (Pulling down)
Kryopulos method (doc)
Bagdasarov (doc) (HDC method)
LEC method (doc) (Liquid Encapsulated Czochralski)
The development of Crystal Growth Technology (pdf) — Hans J. Scheel, Chairman of IOCG (Excellent review on Crystal growth history and future)

Knowledge on Thin Film

How to make Thin Film by dip coating
Definition of dip coating (wiki)
Crystallization Study of SrTio (pdf)

How to deopiste thin film by thermo-evaporation
Thin Film Deposition & Vacuum Technology (pdf)

Knowledge on Film Growth

Principle of Thin Film Deposition (ppt)
Plasma sputter coating (pdf)
Chemical vapor deposition technique (CVD) (wiki)
●MOCVD technology and material growth
Physical vapor deposition technique (PVD) for growing nanostructures by tube furnace
Laser ablation technique
Growth of ZnO nano-rod by VLS process in tube furnace (pdf)
Growth of Si nano-wire by VLS process (pdf)

 

 


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